Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...

BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...

SANTA CLARA, Calif., July 29, 2025 (GLOBE NEWSWIRE) -- Multibeam Corp. today announced that it has raised $31 million in Series B funds from global investors led by Onto Innovation Inc. (ONTO) (NYSE: ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...

The new electron-beam lithography system (E-Beam) will be used to manufacture high-precision micro-optical components for customers in the semiconductor and optical communication sectors. The ...

KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...

SANTA CLARA, Calif., June 27, 2024 (GLOBE NEWSWIRE) -- In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam ...

China has unveiled its first domestically developed commercial electron-beam lithography (EBL) tool, marking a symbolic step forward in efforts to reduce reliance on foreign semiconductor ...

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to ...

In addition, it is the only production lithography tool capable of sub 50 nm geometries on 200 mm wafers. Uniquely configured with multiple miniaturized electron beam columns, the MB platform elevates ...