ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

New VeritySEM ® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However, the ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

The first lithography tools were fairly simple, but the technologies that produce today’s chips are among humankind’s most complex inventions. When we talk about computing these days, we tend to talk ...

In spite of the global tech restrictions, Shanghai Micro Electronics Equipment (SMEE), China‘s leading lithography scanner producer, is gearing up to roll out its first 28nm-class fabrication process ...

China is scrambling to counter U.S. chip restrictions, but its attempts at manufacturing key equipment reveal it's not just a matter of spending billions. Making the most advanced semiconductors ...

Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). Our EUV diffractive imaging experiment setup. A photo of the high-harmonic generation (HHG) ...